Abstract
Abstract
This study investigated the crystallographic plane dependence of the reaction of AlN and AlGaN using heated-pressurized water under saturated vapor pressure. The results show that the reaction strongly depends on the crystallographic orientation plane, with no reaction in the +c-plane, the formation of an AlOOH-altered layer in the −c-plane, and etching in the a- and m-planes. These results suggest that the exfoliation mechanism of AlGaN grown on periodically formed AlN nanopillars on sapphire substrates using heated-pressurized water involves etching of a- and m-plane crystals, demonstrating that the proposed method is highly reproducible and versatile for large-diameter wafer exfoliation.
Funder
MOE program
Japan Society for the Promotion of Science
New Energy and Industrial Technology Development Organization
Japan Science and Technology Corporation
Subject
General Physics and Astronomy,General Engineering
Cited by
1 articles.
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