MAGNETRON SPUTTER DEPOSITION OF TUNGSTEN COATINGS IN DEUTERIUM-HELIUM MIXTURES
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Published:2023
Issue:4
Volume:27
Page:25-32
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ISSN:1093-3611
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Container-title:High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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language:en
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Short-container-title:High Temp Mat Proc
Author:
Kharkov Maksim M.,Lomonosov G.S.,Kolodko D.V.,Kukushkina M.S.,Kaziev A.V.,Tumarkin A.V.,Ogorodnikova O.V.
Abstract
The electrical parameters of a high-power impulse magnetron sputtering (HiPIMS) discharge operating in H<sub>2</sub>/He mixtures were studied using different values of the pulse width, repetition frequency, and power. Deposition of tungsten (W) coatings was carried out in a magnetron discharge with a thermally insulated W target in two regimes at different pulse widths (80 and 500 µs) and frequencies (2 and 0.5 kHz). The average discharge power was fixed at P<sub>d</sub> = 1500 W. Fusion-relevant molecular deuterium/helium (He) and hydrogen/He gas mixtures with a 90/10 flow ratio were used in the experiments.
Subject
Physical and Theoretical Chemistry,Spectroscopy,General Engineering,Energy Engineering and Power Technology,Condensed Matter Physics,General Materials Science
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