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Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter

  • Published:2008-06-20 Issue:6 Volume:47 Page:4872-4877
  • ISSN:0021-4922
  • Container-title:Japanese Journal of Applied Physics
  • language:en
  • Short-container-title:Jpn. J. Appl. Phys.

Author:

Osugi Masafumi,Tanaka Kazuumi,Sakaya Noriyuki,Hamamoto Kazuhiro,Watanabe Takeo,Kinoshita Hiroo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extending resonant inelastic X-ray scattering to the extreme ultraviolet;Frontiers in Physics;2015-05-18

2. Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11

3. Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks;2010 IEEE Photinic Society's 23rd Annual Meeting;2010-11

4. Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks;Optics Express;2010-06-22

5. Imaging Performance Improvement of an Extreme Ultraviolet Microscope;Japanese Journal of Applied Physics;2010-06-21
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