Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks-Reference-Cited by-同舟云学术

Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks

Published:2010-06-22 Issue:14 Volume:18 Page:14467
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Brizuela Fernando,Carbajo Sergio,Sakdinawat Anne,Alessi David,Martz Dale H.,Wang Yong,Luther Bradley,Goldberg Kenneth A.,Mochi Iacopo,Attwood David T.,La Fontaine Bruno,Rocca Jorge J.,Menoni Carmen S.

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference12 articles.

1. Experimental Investigations on Particle Contamination of Masks Without Protective Pellicles During Vibration or Shipping of Mask Carriers

2. Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements

3. Actinic extreme ultraviolet mask inspection beyond 0.25numericalaperture

4. Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter

5. Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light

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