Studies on the Degradation of InP/InGaAs/InP Double Heterojunction Bipolar Transistors Induced by Silicon Nitride Passivation
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/41/i=2S/a=1059/pdf
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Passivation of InP heterojunction bipolar transistors by strain controlled plasma assisted electron beam evaporated hafnium oxide;Applied Physics Letters;2012-01-02
2. Hafnium oxide passivation of InGaAs/InP heterostructure bipolar transistors by electron beam evaporation;physica status solidi (c);2011-11-02
3. Surface Passivation of InGaAs/InP HBTs Using Atomic Layer Deposited Al2O3;ECS Transactions;2011-04-25
4. Atomic Layer Deposition of Aluminum Oxide for Surface Passivation of InGaAs∕InP Heterojunction Bipolar Transistors;Journal of The Electrochemical Society;2011
5. Collector Ideality Factor and Emitter-Base Tunneling Energy at InP/InGaAs Heterojunction Bipolar Transistors;ECS Transactions;2010-10-01
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