Behavior of Electrons and Negative Ions in a Capacitively-Coupled Radio-Frequency NF3/Ar Plasma-Reference-Cited by-同舟云学术

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Behavior of Electrons and Negative Ions in a Capacitively-Coupled Radio-Frequency NF3/Ar Plasma

Published:1997-07-30 Issue:Part 1, No. 7B Volume:36 Page:4651-4655
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Hayashi Toshiyasu,Kono Akihiro,Goto Toshio

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Rapid electron density decay observed by surface-wave probe in afterglow of pulsed fluorocarbon-based plasma;Japanese Journal of Applied Physics;2016-07-15

2. Electron collisions with nitrogen trifluoride(NF3)molecules;Physical Review A;2004-09-22

3. Negative ions in processing plasmas and their effect on the plasma structure;Applied Surface Science;2002-05

4. Behaviors of electron and negative-ion densities in low-pressure high-density inductively coupled plasmas of SF6, NF3, CF4, and C4F8 gases diluted with Ar;Thin Solid Films;2002-03

5. Measurement of negative-ion density in high-density C4F8 plasma using a laser photodetachment technique combined with a millimeter-wave open resonator;Applied Physics Letters;2000-07-24

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