Surface Reaction Kinetics of CH3in CH4RF Discharge Studied by Time-Resolved Threshold Ionization Mass Spectrometry-Reference-Cited by-同舟云学术

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Surface Reaction Kinetics of CH3in CH4RF Discharge Studied by Time-Resolved Threshold Ionization Mass Spectrometry

Published:1997-07-30 Issue:Part 1, No. 7B Volume:36 Page:4752-4755
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Shiratani Masaharu,Jolly Jacques,Videlot Hervé,Perrin Jérôme

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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