Low-Temperature Process for Advanced Si Thin Film Transistor Technology-Reference-Cited by-同舟云学术

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Low-Temperature Process for Advanced Si Thin Film Transistor Technology

Published:2006-05-25 Issue:5B Volume:45 Page:4321-4324
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Noguchi Takashi,Kwon Jang Yeon,Jung Ji Sim,Kim Jong Man,Park Kyung Bae,Lim Hyuck,Kim Do Young,Cho Hans S.,Yin Hua Xian,Xianyu Wenxyu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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