Rapid Recrystallization of Amorphous Silicon Utilizing Very-High-Frequency Microplasma Jet at Atmospheric Pressure-Reference-Cited by-同舟云学术

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Rapid Recrystallization of Amorphous Silicon Utilizing Very-High-Frequency Microplasma Jet at Atmospheric Pressure

Published:2006-10-24 Issue:10B Volume:45 Page:8484-8487
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ryo Mina,Sakurai Yusuke,Kobayashi Tomohiro,Shirai Hajime

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An efficient approach for atomic-scale polishing of single-crystal silicon via plasma-based atom-selective etching;International Journal of Machine Tools and Manufacture;2020-12

2. Rapid Atmospheric Pressure Plasma Jet Processed Reduced Graphene Oxide Counter Electrodes for Dye-Sensitized Solar Cells;ACS Applied Materials & Interfaces;2014-08-26

3. Effect of reducing impurity concentration of microcrystalline silicon thin films for solar cells using radio frequency hollow electrode enhanced glow plasma;Vacuum;2014-03

4. Atmospheric-Pressure-Plasma-Jet Particulate TiO2Scattering Layer Deposition Processes for Dye-Sensitized Solar Cells;ECS Journal of Solid State Science and Technology;2014

5. Annealing performance improvement of elongated inductively coupled plasma torch and its application to recovery of plasma-induced Si substrate damage;Japanese Journal of Applied Physics;2014-01-01

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