Author:
Shukuri Shoji,Wada Yasuo,Masuda Hiroo,Ishitani Tohru,Tamura Masao
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
13 articles.
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1. Maskless fabrication of JFETs via focused ion beams;Solid-State Electronics;2004-10
2. Nonuniform-channel MOS device;Applied Physics A: Materials Science & Processing;2003-05-01
3. The Physics of Ion-Beam Lithography;The Physics of Submicron Lithography;1992
4. Damage formation and annealing of ion implantation in Si;Materials Science Reports;1991-04
5. Two-dimensional distributions of secondary defects in focused ion beam implantation into Si;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1988-05