Understanding Lithography Technology Issues through Simulation
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A 2D Waveguide Method for Lithography Simulation of Thick SU-8 Photoresist;Micromachines;2020-10-29
2. Design of a dedicated parallel processor for the simulation of the photolithography process using a genetic algorithm;Engineering Applications of Artificial Intelligence;1999-08
3. Neural networks for the simulation of photoresist exposure process in integrated circuit fabrication;Modelling and Simulation in Materials Science and Engineering;1997-09-01
4. Simulation of the negative chemical amplification deep-ultraviolet process in integrated circuit fabrication;Microelectronic Engineering;1997-09
5. Simulation of the image reversal submicron process in integrated circuit fabrication;Semiconductor Science and Technology;1996-02-01
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