Neural networks for the simulation of photoresist exposure process in integrated circuit fabrication-Reference-Cited by-同舟云学术

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Neural networks for the simulation of photoresist exposure process in integrated circuit fabrication

Published:1997-09-01 Issue:5 Volume:5 Page:439-450
ISSN:0965-0393
Container-title:Modelling and Simulation in Materials Science and Engineering
language:
Short-container-title:Modelling Simul. Mater. Sci. Eng.

Author:

Mardiris V,Karafyllidis I,Soudris D,Thanailakis A

Publisher

IOP Publishing

Subject

Computer Science Applications,Mechanics of Materials,Condensed Matter Physics,General Materials Science,Modeling and Simulation

Reference16 articles.

1. Understanding Lithography Technology Issues through Simulation

2. Massively parallel computing in materials modeling

3. Massively parallel algorithms for scattering in optical lithography

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Machine Learning for Compact Lithographic Process Models;Machine Learning in VLSI Computer-Aided Design;2019

2. Statistical approach utilizing neural networks for CD error prediction;SPIE Proceedings;2007-03-16

3. Study of the effects of photoresist surface roughness and defects on developed profiles;Semiconductor Science and Technology;2000-02-01

4. Study of lithography profiles developed on non-planar Si surfaces;Nanotechnology;1999-12-01

5. A three-dimensional photoresist etching simulator for TCAD;Modelling and Simulation in Materials Science and Engineering;1999-01-01

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