Study of Surface Reaction Probability of CFxRadicals by Trench Deposition Method-Reference-Cited by-同舟云学术

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Study of Surface Reaction Probability of CFxRadicals by Trench Deposition Method

Published:1991-11-15 Issue:Part 1, No. 11A Volume:30 Page:2873-2877
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yabe Hideki,Yuuki Akimasa,Matsui Yasuji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Morphology of films deposited on the sidewall during the Bosch process using C₄F₈ plasmas;Journal of Micromechanics and Microengineering;2024-07-24

2. Effects of C4F8 plasma polymerization film on etching profiles in the Bosch process;Journal of Vacuum Science & Technology A;2023-10-02

3. Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development;Japanese Journal of Applied Physics;2019-05-30

4. Progress and perspectives in dry processes for nanoscale feature fabrication: fine pattern transfer and high-aspect-ratio feature formation;Japanese Journal of Applied Physics;2019-05-30

5. Analysis of flow field characteristics in IC equipment chamber based on orthogonal design;IOP Conference Series: Materials Science and Engineering;2017-01

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