Novel Process for High-Density Buried Nanopyramid Array Fabrication by Means of Dopant Ion Implantation and Wet Etching-Reference-Cited by-同舟云学术

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Novel Process for High-Density Buried Nanopyramid Array Fabrication by Means of Dopant Ion Implantation and Wet Etching

Published:2001-04-30 Issue:Part 1, No. 4B Volume:40 Page:2837-2839
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Koh Meishoku,Goto Tomomi,Sugita Atsushi,Tanii Takashi,Iida Tomoyuki,Shinada Takahiro,Matsukawa Takashi,Ohdomari Iwao

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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5. Removal and characterization of focused-ion-beam-induced damaged layer on single crystal diamond surface and application to multiple depth patterning;Diamond and Related Materials;2016-11

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