Author:
Oda Masatoshi,Ohki Shigehisa,Ozawa Akira,Ohkubo Takashi,Yoshihara Hideo
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
9 articles.
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1. Use of oxygen gas in diamond film growth for improving stress and crystallinity properties of an x-ray mask;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-05
2. Pattern placement errors in mask membranes;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11
3. Simulation of X-Ray Mask Pattern Displacement;Japanese Journal of Applied Physics;1996-12-30
4. X-ray mask distortion correction technology using pattern displacement simulator;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11
5. A Highly Accurate Stress Measurement System for Producing Precise X-Ray Masks;Japanese Journal of Applied Physics;1995-12-30