Fluorescent UV-Curable Resists for UV Nanoimprint Lithography
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference19 articles.
1. Mold-assisted nanolithography: A process for reliable pattern replication
2. Step and flash imprint lithography: a new approach to high-resolution patterning
3. Imprint Characteristics by Photo-Induced Solidification of Liquid Polymer
4. Nanoscale Patterning by UV Nanoimprint Lithography Using an Organometallic Resist
5. Fabrication of Capacity-Equalized Mold for Homogenizing Residual Layer Thickness in Imprint Lithography
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