Identification of Desorption Products from the Thermal Reaction of AlN with XeF2Vapor Using Molecular Beam Mass Spectrometry and a Time-of-Flight Technique-Reference-Cited by-同舟云学术

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Identification of Desorption Products from the Thermal Reaction of AlN with XeF2Vapor Using Molecular Beam Mass Spectrometry and a Time-of-Flight Technique

Published:2003-04-01 Issue:Part 2, No. 4A Volume:42 Page:L356-L358
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Watanabe Morimichi,Iida Takashi,Akiyama Keijiro,Narita Shogo,Ishikawa Takahiro,Sakai Hiroaki,Sawabe Kyoichi,Shobatake Kosuke

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/42/i=4A/a=L356/pdf

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Use of molecular beams for kinetic measurements of chemical reactions on solid surfaces;Surface Science Reports;2017-05

2. Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-03

3. Desorption and sublimation kinetics for fluorinated aluminum nitride surfaces;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-09

4. Thermal reaction of polycrystalline AlN with XeF2;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2005-11

5. X-ray photoelectron spectroscopy of polycrystalline AlN surface exposed to the reactive environment of XeF2;Applied Surface Science;2003-07

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