Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing
Author:
Affiliation:
1. Laboratoire des Composites Thermostructuraux (CNRS, CEA, Safran, Université de Bordeaux), 3, Allée de La Boétie, Pessac 33600, France
2. Department of Physics, University at Albany, 1400 Washington Avenue, Albany, New York 12222
Funder
Defense Threat Reduction Agency (DTRA)
Intel Corporation (Intel)
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/am-pdf/10.1116/1.4974920
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