Physical and Barrier Properties of Plasma Enhanced Chemical Vapor Deposition α-SiC:N:H Films-Reference-Cited by-同舟云学术

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Physical and Barrier Properties of Plasma Enhanced Chemical Vapor Deposition α-SiC:N:H Films

Published:2003-07-15 Issue:Part 1, No. 7A Volume:42 Page:4489-4494
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Chiang Chiu-Chih,Wu Zhen-Cheng,Wu Wei-Hao,Chen Mao-Chieh,Ko Chung-Chi,Chen Hsi-Ping,Jang Syun-Ming,Yu Chen-Hua,Liang Mong-Song

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/42/i=7R/a=4489/pdf

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Understanding the Reaction Chemistry of 1,1,3,3-Tetramethyldisilazane as a Precursor Gas in a Catalytic Chemical Vapor Deposition Process;The Journal of Physical Chemistry A;2023-10-26

2. Comprehensive Study of the Chemical, Physical, and Structural Evolution of Molecular Layer Deposited Alucone Films during Thermal Processing;Chemistry of Materials;2023-02-22

3. Theoretical Study on the Decomposition Kinetics and Thermochemistry of Tetramethyldisilazane and Hexamethyldisilazane─Formation of Silanimine and Silene Species;The Journal of Physical Chemistry A;2022-10-31

4. Low-energy Ar+ and N+ ion beam induced chemical vapor deposition using hexamethyldisilazane for the formation of nitrogen containing SiC and carbon containing SiN films;PLOS ONE;2021-10-27

5. Influence of Substrate Temperature on Electrical and Optical Properties of Hydrogenated Boron Carbide Thin Films Deposited by RF Sputtering;Coatings;2021-02-09

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