Author:
Shiokawa Takao,Kim Pil Hyon,Toyoda Koichi,Namba Susumu,Gamo Kenji,Aihara Ryuso,Anazawa Norimichi
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
18 articles.
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1. Channeling contrast analysis of local damage distributions induced by maskless implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04
2. Focused ion beam technology;Vacuum;1991-01
3. RECENT ADVANCE OF FOCUSED ION BEAM TECHNOLOGY IN JAPAN;Frontiers of Materials Research: Electronic and Optical Materials;1991
4. Focused High-Energy Heavy Ion Beams;Japanese Journal of Applied Physics;1990-06-20
5. Chapter 2 Focused Ion Beam Implantation TechnologyS;Semiconductors and Semimetals;1990