Properties of Hydro-Fluorinated Amorphous Silicon-Carbide Produced by Intermediate Species SiF2-Reference-Cited by-同舟云学术

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Properties of Hydro-Fluorinated Amorphous Silicon-Carbide Produced by Intermediate Species SiF2

Published:1985-10-20 Issue:Part 1, No. 10 Volume:24 Page:1263-1266
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Uesugi Takashi,Ihara Hisanori,Matsumura Hideki

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma deposition of amorphous silicon alloys from fluorinated gases;Pure and Applied Chemistry;1996-01-01

2. Deposition of Fluorinated a ‐ SiC : H Films at Room Temperature;Journal of The Electrochemical Society;1994-12-01

3. Differences in physical properties of hydrogenated and fluorinated amorphous silicon carbide prepared by reactive sputtering;Journal of Applied Physics;1992-06

4. Hydrogenated Amorphous Silicon, Its Alloys and Their Device Applications;New Materials;1992

5. A Comparison between Fluorinated and Hydrogenated Amorphous Silicon Carbide Prepared by Reactive Sputtering;Tenth E.C. Photovoltaic Solar Energy Conference;1991

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