Direct Etching of Resists by UV Light
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The new dry method of mask (relief) formation by direct electron-beam etching of resist;Microelectronic Engineering;2013-12
2. A new method of formation of the masking image (relief) directly during the electron-beam exposure of the resist;Russian Microelectronics;2013-09
3. Industrial processing of polymers by low-pressure plasmas: the role of VUV radiation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1999-05
4. Synchrotron radiation direct photo-etching of polymers and crystals for micromachining;Journal of Synchrotron Radiation;1998-05-01
5. References;Photodegradation of Polymers;1996
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