High-Rate Reactive Ion Etching of SiO2Using a Magnetron Discharge-Reference-Cited by-同舟云学术

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High-Rate Reactive Ion Etching of SiO2Using a Magnetron Discharge

Published:1981-11 Issue:11 Volume:20 Page:L817-L820
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Horiike Yasuhiro,Okano Haruo,Yamazaki Takashi,Horie Hiromichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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