Effects of multipolar magnetic fields on the characteristics of plasma and photoresist etching in an internal linear inductively coupled plasma system-Reference-Cited by-同舟云学术

Effects of multipolar magnetic fields on the characteristics of plasma and photoresist etching in an internal linear inductively coupled plasma system

Published:2004-01 Issue: Volume:177-178 Page:752-757
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kim K.N.,Lee Y.J.,Kyong S.J.,Yeom G.Y.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference14 articles.

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2. Review of inductively coupled plasmas for plasma processing

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5. Large area radio frequency plasma for microelectronics processing

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