Performance Improvement of a Discharge-Pumped ArF Excimer Laser by Xenon Gas Addition-Reference-Cited by-同舟云学术

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Performance Improvement of a Discharge-Pumped ArF Excimer Laser by Xenon Gas Addition

Published:1999-12-15 Issue:Part 1, No. 12A Volume:38 Page:6735-6738
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kataoka Naoki,Itagaki Motoya,Uchino Kiichiro,Muraoka Katsunori,Takahashi Akihiko,Okada Tatsuo,Maeda Mitsuo,Hori Tsukasa,Terashima Katsutomo,Sumitani Akira,Enami Tatsuo,Mizoguchi Hakaru

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photo-triggering and secondary electron produced ionization in electric discharge ArF* excimer lasers;Journal of Applied Physics;2011-10-15

2. Temporal extension of stable glow discharges in fluorine-based excimer laser gas mixtures by the addition of xenon;Applied Physics B;2009-03-04

3. Elucidation of Steplike Output Energy Decrease Observed in ArF Excimer Laser for Microlithography;Japanese Journal of Applied Physics;2007-05-08

4. Investigation of a Step-Like Output Energy Decrease Observed in an ArF Excimer Laser for Microlithography;Japanese Journal of Applied Physics;2006-09-22

5. Performance Improvement of an ArF Excimer Laser for Microlithography by Means of Gaseous Impurity Control;The Review of Laser Engineering;2005

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