Thin Film Growth of YBa2Cu3O7-xby ECR Oxygen Plasma Assisted Reactive Evaporation-Reference-Cited by-同舟云学术

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Thin Film Growth of YBa2Cu3O7-xby ECR Oxygen Plasma Assisted Reactive Evaporation

Published:1989-04-20 Issue:Part 2, No. 4 Volume:28 Page:L635-L638
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Aida Toshiyuki,Tsukamoto Akira,Imagawa Kazushige,Fukazawa Tokuumi,Saito Sakae,Shindo Keijiro,Takagi Kazumasa,Miyauchi Katsuki

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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