Material Properties of Heteroepitaxial Ir and Pb(ZrxTi1-x)O3Films on (100)(ZrO2)1-x(Y2O3)x/(100)Si Structure Prepared by Sputtering-Reference-Cited by-同舟云学术

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Material Properties of Heteroepitaxial Ir and Pb(ZrxTi1-x)O3Films on (100)(ZrO2)1-x(Y2O3)x/(100)Si Structure Prepared by Sputtering

Published:1998-09-30 Issue:Part 1, No. 9B Volume:37 Page:5141-5144
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Horita Susumu,Horii Sadayoshi,Umemoto Shinya

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Epitaxial growth of metallic buffer layer structure andc-axis oriented Pb(Mn1/3,Nb2/3)O3–Pb(Zr,Ti)O3thin film on Si for high performance piezoelectric micromachined ultrasonic transducer;Japanese Journal of Applied Physics;2017-11-21

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