Surface Kinetics of CFxRadicals and Fluorine Atoms in the Afterglow of High-Density C4F8Plasmas-Reference-Cited by-同舟云学术

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Surface Kinetics of CFxRadicals and Fluorine Atoms in the Afterglow of High-Density C4F8Plasmas

Published:1998-10-15 Issue:Part 1, No. 10 Volume:37 Page:5763-5766
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Suzuki Chihiro,Sasaki Koichi,Kadota Kiyoshi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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4. Electron and negative ion dynamics in a pulsed 100 MHz capacitive discharge produced in an O2 and Ar/O2/C4F8 gas mixture;Plasma Sources Science and Technology;2020-03-13

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