Power Spectrum of Smoothed Line-Edge and Line-Width Roughness
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference26 articles.
1. CD-SEM measurement line-edge roughness test patterns for 193-nm lithography
2. Characterisation and modeling of mismatch in MOS transistors for precision analog design
3. Matching properties of MOS transistors
4. Characterization and modeling of line width roughness (LWR)
5. Unbiased estimation of linewidth roughness
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1. Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography;ACS Omega;2023-07-23
2. Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation;Journal of Physics D: Applied Physics;2017-09-15
3. Noise filtering of scanning-electron-microscope images for accurate analysis of line-edge and line-width roughness;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-11-30
4. Scanning-electron-microscope image processing for accurate analysis of line-edge and line-width roughness;SPIE Proceedings;2012-03-29
5. Statistical Model of Line-Edge and Line-Width Roughness for Device Variability Analysis;IEEE Transactions on Electron Devices;2011-06
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