Effect of Acid Generator Decomposition during Exposure on Acid Image Quality of Chemically Amplified Extreme Ultraviolet Resists
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference32 articles.
1. Recent status and future direction of EUV resist technology
2. EUV Lithography Development and Research Challenges for the 22 nm Half-pitch
3. Characterization of positive photoresist
4. Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist
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