Preparation of Cubic Boron Nitride Films by RF Sputtering-Reference-Cited by-同舟云学术

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Preparation of Cubic Boron Nitride Films by RF Sputtering

Published:1990-07-20 Issue:Part 2, No. 7 Volume:29 Page:L1175-L1177
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Mieno Masahiro,Yoshida Toyonobu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 160 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study on Ion Flux From Magnetically Confined Low-Pressure Arc Discharge With a Thermionic Cathode to Substrate for High-Throughput Film Deposition Processes;IEEE Transactions on Plasma Science;2024

2. Comparative Study on Residual Stress of Cubic Boron Nitride Films Deposited Using DC and RF Sputtering Sources;Metals and Materials International;2023-01-21

3. A Review on Ultrathin Ceramic-Coated Separators for Lithium Secondary Batteries using Deposition Processes;J KOREAN ELECTROCHEM;2022

4. Hexagonal Boron Nitride on III–V Compounds: A Review of the Synthesis and Applications;Materials;2022-06-22

5. Ion irradiation-induced sputtering and surface modification of BN films prepared by a reactive plasma-assisted coating technique;Japanese Journal of Applied Physics;2022-06-13

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