Novel Process for Direct Delineation of Spin on Glass (SOG)
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nanolithography using spin-coatable ZrO2resist and its application to sub-10 nm direct pattern transfer on compound semiconductors;Nanotechnology;2008-03-11
2. Internal structure transition of spin-on glass by electron beam irradiation;Applied Surface Science;2007-04
3. Focused Ion Beam Lithography Using Ladder Silicone Spin-on Glass as a Positive Resist;Japanese Journal of Applied Physics;1996-12-30
4. Fine $\bf SiO_{2}$ Pattern Generation by Electron Beam Direct Writing onto Polysiloxene-Based Thin Films and Its Application to Etch Mask;Japanese Journal of Applied Physics;1996-04-15
5. Focused ion beam/optical-merged lithographic technique using ladder silicone spin-on glass;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11
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