Fine $\bf SiO_{2}$ Pattern Generation by Electron Beam Direct Writing onto Polysiloxene-Based Thin Films and Its Application to Etch Mask
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Published:1996-04-15
Issue:Part 2, No. 4B
Volume:35
Page:L519-L522
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Okamoto Katsuhiko,Yamakawa Shinpei,Miyazaki Seiichi,Hirose Masataka
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering