Fractal Roughness of Polymers after Lithographic Processing-Reference-Cited by-同舟云学术

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Fractal Roughness of Polymers after Lithographic Processing

Published:2005-01-14 Issue:No. 5 Volume:44 Page:L186-L189
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Constantoudis Vassilios,Gogolides Evangelos,Patsis George P.,Sarris Vassilios,Tserepi Angeliki,Diakoumakos Constantinos,Valamontes Evangelos S.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fractals and device performance variability: The key role of roughness in micro and nanofabrication;Microelectronic Engineering;2012-02

2. Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution;European Polymer Journal;2010-10

3. Effects of model polymer chain architectures and molecular weight of conventional and chemically amplified photoresists on line-edge roughness. Stochastic simulations;Microelectronic Engineering;2006-04

4. A review of line edge roughness and surface nanotexture resulting from patterning processes;Microelectronic Engineering;2006-04

5. Line-width roughness analysis of EUV resists after development in homogenous CO 2 solutions using CO 2 compatible salts (CCS) by a three-parameter model;SPIE Proceedings;2006-03-10

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