Single-Oriented Growth of (111) Cu Film on Thin ZrN/Zr Bilayered Film for ULSI Metallization
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Microstructure, properties and applications of Zr-carbide, Zr-nitride and Zr-carbonitride coatings: a review;Materials Advances;2020
2. Characterization of ZrN, ZrO2 and β′-Zr7 O11 N2 nanoparticles synthesized by pulsed wire discharge;Journal of the American Ceramic Society;2017-06-19
3. Effects of substrate bias and nitrogen flow ratio on the surface morphology and binding state of reactively sputtered ZrNx films before and after annealing;Applied Surface Science;2009-07
4. WITHDRAWN: Effect of substrate temperature on the thermal stability of Cu/Zr–N/Si contact system;Materials Letters;2008-05
5. Mechanistic details of atomic layer deposition (ALD) processes for metal nitride film growth;Journal of Molecular Catalysis A: Chemical;2008-02
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