Ion Impact Energy Distributions and Properties of Amorphous Hydrogenated Carbon Thin Films Deposited in a Self-Biased RF Discharge-Reference-Cited by-同舟云学术

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Ion Impact Energy Distributions and Properties of Amorphous Hydrogenated Carbon Thin Films Deposited in a Self-Biased RF Discharge

Published:1994-11-15 Issue:Part 1, No. 11 Volume:33 Page:6341-6349
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Tatsuta Toshiaki,Tachibana Kunihide,Tsuji Osamu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Acetylene–argon plasmas measured at an rf-biased substrate electrode for diamond-like carbon deposition: II. Ion energy distributions;Plasma Sources Science and Technology;2011-01-07

2. Acetylene–argon plasmas measured at a biased substrate electrode for diamond-like carbon deposition: I. Mass spectrometry;Plasma Sources Science and Technology;2011-01-07

3. Molecular dynamics simulation of the formation ofsp3hybridized bonds in hydrogenated diamondlike carbon deposition processes;Physical Review E;2010-04-05

4. Morphological features of diamond-like carbon films deposited by plasma-enhanced CVD;Journal of Non-Crystalline Solids;2000-01

5. Deposition of Cubic-SiC Thin Films on Si (111) using the Molecular Ion Beam Technique;MRS Proceedings;1999

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