Wafer Treatment Using Electrolysis-Ionized Water-Reference-Cited by-同舟云学术

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Wafer Treatment Using Electrolysis-Ionized Water

Published:1994-10-15 Issue:Part 1, No. 10 Volume:33 Page:5686-5689
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Aoki Hidemitsu,Nakamori Masaharu,Aoto Nahomi,Ikawa Eiji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Emergence of the Science and Technology of Electroactivated Aqueous Solutions: Applications for Environmental and Food Safety;Environmental Security and Ecoterrorism;2011

2. Evaluation for Surface Cleanness of Metals Washed by the Electrolyzed Acid Water;Journal of The Surface Finishing Society of Japan;2004

3. Evaluation for Surface Cleanness of Metals Washed by the Electrolyzed Alkaline Water;Journal of The Surface Finishing Society of Japan;2003

4. Effects of Amplitude of the Radiofrequency Electromagnetic Radiation on Aqueous Suspensions and Solutions;Journal of Colloid and Interface Science;1998-04

5. Reduction of Staphylococcus aureus in atopic skin lesions with acid electrolytic water - a new therapeutic strategy for atopic dermatitis;Allergy;1997-10

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