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Simulation of Resist Filling Properties under Condensable Gas Ambient in Ultraviolet Nanoimprint Lithography

  • Published:2012-06-20 Issue: Volume:51 Page:06FJ07
  • ISSN:0021-4922
  • Container-title:Japanese Journal of Applied Physics
  • language:en
  • Short-container-title:Jpn. J. Appl. Phys.

Author:

Nagaoka Yoshinori,Suzuki Ryosuke,Hiroshima Hiroshi,Nishikura Naoki,Kawata Hiroaki,Yamazaki Noboru,Iwasaki Takuya,Hirai Yoshihiko

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Numerical Investigation for the Resin Filling Behavior during Ultraviolet Nanoimprint Lithography of Subwavelength Moth-Eye Nanostructure;Coatings;2021-07-01

2. Filling angle and its effect on filling process in roll-to-roll ultraviolet imprint lithography;Journal of Micromechanics and Microengineering;2018-02-05

3. Effect of resin accumulation on filling process in roll-to-roll UV imprint lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-05

4. Study on bubble defects in roll-to-roll UV imprinting process for micropyramid arrays II: Numerical study;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-09

5. Bubble-free high-speed UV nanoimprint lithography using condensable gas with very low global warming potential;Japanese Journal of Applied Physics;2016-06-09
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