Fabrication of Molds with 25-nm Dot-Pitch Pattern by Focused Ion Beam and Reactive Ion Etching for Nanoimprint Using Metallic Glass-Reference-Cited by-同舟云学术

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Fabrication of Molds with 25-nm Dot-Pitch Pattern by Focused Ion Beam and Reactive Ion Etching for Nanoimprint Using Metallic Glass

Published:2012-07-20 Issue: Volume:51 Page:086702
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Fukuda Yasuyuki,Saotome Yasunori,Nishiyama Nobuyuki,Saidoh Noriko,Makabe Eiichi,Inoue Akihisa

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrostatic metallic glass micro-mirror fabricated by the self-aligned structures;Japanese Journal of Applied Physics;2020-03-06

2. Development of Functional Metallic Glassy Materials by FIB and Nanoimprint Technologies;Lecture Notes in Nanoscale Science and Technology;2013

3. Fabrication of nanodot array mold with 2 Tdot/in.2 for nanoimprint using metallic glass;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-11

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