Author:
Nakamura Jiro,Kawai Yoshio,Deguchi Kimiyoshi,Matsuda Tadahito,Oda Masatoshi
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
2 articles.
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1. Resists for X-ray Lithography;Encyclopedia of Materials: Science and Technology;2001
2. Analysis of resist LER for the patterns replicated by proximity X-ray lithography;Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)