Photoresist Etching by Atmospheric Pressure Uniform-Glow Plasma
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference8 articles.
1. Oxygen plasma etching for resist stripping and multilayer lithography
2. Low-pressure plasma cleaning: a process for precision cleaning applications
3. Open air photoresist ashing by a cold plasma torch: Catalytic effect of cathode material
4. Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
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1. Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma;Nanomaterials;2022-10-27
2. Atmospheric plasma etching of polymers: A palette of applications in cleaning/ashing, pattern formation, nanotexturing and superhydrophobic surface fabrication;Microelectronic Engineering;2018-07
3. Development of a scanning nanopipette probe microscope for fine processing using atmospheric pressure plasma jet;Japanese Journal of Applied Physics;2016-07-13
4. Fast, downstream removal of photoresist using reactive oxygen species from the effluent of an atmospheric pressure plasma Jet;Plasma Sources Science and Technology;2016-03-10
5. Stripping of High-Dose Ion-Implanted Photoresist Using a Combination of Dry and Wet Single-Wafer Processing;ECS Journal of Solid State Science and Technology;2012-12-31
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