Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge-Reference-Cited by-同舟云学术

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Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge

Published:2002-09-15 Issue:Part 1, No. 9 Volume:41 Page:5797-5798
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yoshiki Hiroyuki,Taniguchi Kazutake,Horiike Yasuhiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/41/i=9R/a=5797/pdf

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Separated Type Atmospheric Pressure Plasma Microjets Array for Maskless Microscale Etching;Micromachines;2017-06-01

3. Development of a scanning nanopipette probe microscope for fine processing using atmospheric pressure plasma jet;Japanese Journal of Applied Physics;2016-07-13

4. Fast, downstream removal of photoresist using reactive oxygen species from the effluent of an atmospheric pressure plasma Jet;Plasma Sources Science and Technology;2016-03-10

5. Microwave-excited atmospheric pressure plasma jet with wide aperture for the synthesis of carbon nanomaterials;Japanese Journal of Applied Physics;2014-11-05

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