Fabrication of Nano Electron Source Using Beam-Assisted Process
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/42/i=6S/a=4037/pdf
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Tertiary electrons in single-event time-of-flight Rutherford backscattering spectrometry;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-10
2. Electron transport and room temperature single-electron charging in 10 nm scale PtC nanostructures formed by electron beam induced deposition;Nanotechnology;2017-11-03
3. Improvement of depth resolution and detection efficiency by control of secondary-electrons in single-event three-dimensional time-of-flight Rutherford backscattering spectrometry;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-04
4. Nano electron source fabricated by beam-induced deposition and its unique feature;Microelectronic Engineering;2015-01
5. Optimization of electron beam induced deposition process for the fabrication of diode-like Pt/SiO2/W devices;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-07
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