Multiple-Step Electron Charging in Silicon-Quantum-Dot Floating Gate Metal-Oxide-Semiconductor Memories-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Multiple-Step Electron Charging in Silicon-Quantum-Dot Floating Gate Metal-Oxide-Semiconductor Memories

Published:2003-06-30 Issue:Part 1, No. 6B Volume:42 Page:4134-4137
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ikeda Mitsuhisa,Shimizu Yusuke,Murakami Hideki,Miyazaki Seiichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/42/i=6S/a=4134/pdf

Cited by 50 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Self-assembling mechanism of Si-QDs on thermally grown SiO₂;Japanese Journal of Applied Physics;2024-04-01

2. Characterization of electronic charged states of high density self-aligned Si-based quantum dots evaluated with AFM/Kelvin probe technique;Japanese Journal of Applied Physics;2022-04-20

3. Evaluation of the potential distribution in a multiple stacked Si quantum dots structure by hard X-ray photoelectron spectroscopy;Japanese Journal of Applied Physics;2018-11-26

4. Impact of phosphorus doping to multiple-stacked Si quantum dots on electron emission properties;Materials Science in Semiconductor Processing;2017-11

5. (Invited) Processing and Characterization of High Density Si/Ge Quantum Dots for Electroluminescent Devices;ECS Transactions;2017-08-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP