Step and Flash Nano Imprint Lithography of 80 nm Dense Line Pattern Using Trehalose Derivative Resist Material
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/3/i=2/a=025202/pdf
Reference20 articles.
1. High-resolution defect inspection of step-and-flash imprint lithography for 32-nm half-pitch patterning
2. A Decade of Step and Flash Imprint Lithography
3. Pattern transfer process development for EUVL
4. EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs
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