Metalorganic Chemical Vapor Deposition of Al2O3Thin Films from Dimethylaluminumhydride and O2
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
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3. Structural characterization of mist chemical vapor deposited amorphous aluminum oxide films using water-free solvent;Journal of the Ceramic Society of Japan;2019-08-01
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