Pulsed Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference20 articles.
1. Influence of reactant gas composition on selected properties of N-doped hydrogenated amorphous carbon films
2. Formation of electrically conductive nitrogen‐doped amorphous hydrogenated carbon (diamond‐like carbon) films by the supermagnetron plasma chemical vapor deposition method
3. Formation of Carbon Nitride Films by the Radio-Frequency Plasma Chemical Vapor Deposition Method
4. Nitrogen modification of hydrogenated amorphous carbon films
5. Processing of diamondlike carbon using plasma immersion ion deposition
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Structural, electrical, and optical properties of amorphous carbon nitride films prepared using a hybrid deposition technique;Diamond and Related Materials;2016-03
2. Chemical vapor deposition of a-CNx:H films for electron field emission using band supermagnetron plasma;Journal of Physics: Conference Series;2014-06-03
3. N2or H2/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CNxFilms for Application to Elementary Amorphous CNx:H/p-Si Photovoltaic Cell;Japanese Journal of Applied Physics;2013-11-01
4. Isobutane/N$_{2}$ Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission Applications;Japanese Journal of Applied Physics;2012-08-20
5. Isobutane/N2Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission Applications;Japanese Journal of Applied Physics;2012-08-01
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