N2or H2/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CNxFilms for Application to Elementary Amorphous CNx:H/p-Si Photovoltaic Cell
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference35 articles.
1. Room-temperature electroluminescence from hydrogenated amorphous carbon nitride film
2. Room-temperature low-voltage electroluminescence in amorphous carbon nitride thin films
3. Luminescence Properties of Amorphous Carbon Films Formed Using Supermagnetron Plasma
4. Photovoltaic cell of carbonaceous film/n‐type silicon
5. The a-C:H/p-Si solar cell deposited by pulsed laser deposition
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Growth of 2 inch Si0.5Ge0.5bulk single crystals;Japanese Journal of Applied Physics;2015-01-28
2. Chemical vapor deposition of a-CNx:H films for electron field emission using band supermagnetron plasma;Journal of Physics: Conference Series;2014-06-03
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