Author:
Watanabe Morimichi,Mori Yukimasa,Sakai Hiroaki,Iida Takashi,Koide Shunsuke,Maeta Eri,Sawabe Kyoichi,Shobatake Kosuke
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
2 articles.
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1. Dry etching of SiC using Ar/F2plasma and XeF2plasma;Japanese Journal of Applied Physics;2015-05-11
2. Thermal reaction of polycrystalline SiC with XeF2;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2005-11