Highly Moisture-Resistive SiNxFilms Prepared by Catalytic Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Highly Moisture-Resistive SiNxFilms Prepared by Catalytic Chemical Vapor Deposition

Published:2004-10-01 Issue:No. 10B Volume:43 Page:L1362-L1364
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Heya Akira,Niki Toshikazu,Yonezawa Yasuto,Minamikawa Toshiharu,Muroi Susumu,Izumi Akira,Masuda Atsushi,Umemoto Hironobu,Matsumura Hideki

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/43/i=10B/a=L1362/pdf

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimization of a SiOx/SiNxOyCz multilayer structure for a reliable gas diffusion barrier via low-temperature plasma-enhanced atomic layer deposition;Ceramics International;2019-04

2. Room Temperature Deposition of SiNx and Plasma Polymer Layers for Flexible Multilayer Barrier Films by Plasma Enhanced Chemical Vapor Deposition Processes;Nano;2018-07

3. Impact of hot wire and material gas species on the Cat-CVD coating of gas barrier SiOC thin films onto PET bottles;Surface and Coatings Technology;2018-06

4. Novel Gas Barrier SiOC Coating to PET Bottles through a Hot Wire CVD Method;Journal of Polymers;2016-06-27

5. Industrialization of Hot Wire Chemical Vapor Deposition for thin film applications;Thin Solid Films;2015-11

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